This comprehensive review, summarizes recent advances in the fabrication of well-ordered block copolymer (BCP) thin films by different methods, focusing on the development of silicon-containing BCPs as candidates for lithographic applications. With the advantage of Si-containing blocks, these BCPs offer much smaller feature sizes due to large segregation strength and high etch contrast for the fabrication of well-defined nanopatterns with high resolution. Considering that poly(dimethylsiloxane) (PDMS)-containing BCPs are widely studied systems among Si-containing BCPs, the possibility of using PDMS-containing BCPs for lithographic applications is demonstrated through previous and ongoing key research.

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lithographic applications welldefined nanopatterns siliconcontaining bcps segregation strength etch contrast wellordered block copolymer bcp thin films

Ting-Ya Lo, Kai-Yuan Lu, Rong-Ming Ho, Mohan Raj Krishnan,.Silicon-containing block copolymers for lithographic applications. 77 (0),.

Ting-Ya Lo, et al."Silicon-containing block copolymers for lithographic applications" 77

Ting-Ya Lo, Kai-Yuan Lu, Rong-Ming Ho, Mohan Raj Krishnan,"Silicon-containing block copolymers for lithographic applications"